780 nm Femtosecond Fiber Laser
Description
The 780 nm femtosecond fiber laser is a second harmonic generation (SHG) product of Calmar’s passively mode-locked fiber laser in C-band. For fiber output 780 nm laser, the pulse width is 1.5 ps instead of 0.1 ps due to dispersion. The average power can up to 25 mW. It has excellent stability and reliability. The timing jitter is as low as 60 fs. The repetition rate can be specified from 10 to 50 MHz with a polarization-maintaining (PM) output. An RF synchronization output is provided as a trigger signal. Calmar’s FPL operation is highly stable, which significantly differentiates us from our competitors. Whenever our laser is turned on, it always starts in the same operation state. Calmar’s laser enables end users to focus on their work, not on the laser itself, while our competitors’ laser startup status is unpredictable, requiring constant adjustment during operation.
780 nm Femtosecond Fiber Laser
Specifications |
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Wavelength: | 780 nm |
Repetition Rate: | 30 MHz |
Output Power: | 0.025 W |
Pulse Duration: | 1500 fs |
Features
Wavelength selectable from 775 to 785 nm
Average power 4 - 25 mW
Pulse widths ~ 1.5 ps
Linearly polarized output
Minimal pulse pedestal
Low timing jitter
RF synchronization output
Compact and ruggedized OEM package available
High stability
Applications
Seeding Ti:sapphire amplifiers
Biophotonics
Terahertz radiation
Materials characterization
Optical metrology
Multiphoton imaging microscopy
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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Ships from:
United States
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Sold by:
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On FindLight:
External Vendor
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Frequently Asked Questions
The wavelength range is selectable from 775 to 785 nm.
The average power output can be up to 25 mW.
The pulse width is approximately 1.5 ps.
The timing jitter is as low as 60 fs.
The laser is suitable for applications such as seeding Ti:sapphire amplifiers, biophotonics, terahertz radiation, materials characterization, optical metrology, and multiphoton imaging microscopy.