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Excimer

193nm High Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 100 mJ
Average Power: 600 W
Max Repetition Rate: 6000 Hz
351nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: XeF
Wavelength: 351 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
308nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: XeCl
Wavelength: 308 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
248nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
193nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
GT65A ArF Excimer Laser
Gigaphoton Inc.
GT65A, the seventh generation of platforms using the injection lock method, is installed with leading-edge technology and achieves further improved productivity (wafer output) for the customer through “exposure performance improvements” due to changeable spectral width (E95) and improved stability, “high availability” due to extended ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 20 mJ
Average Power: 60 W
Max Repetition Rate: 6000 Hz
GT64A ArF Immersion Excimer Laser
Gigaphoton Inc.
The GT64A offers the industry\'s highest output power of 120W with  high beam performance and stability.  With design emphasis on performance, efficiency, and reduction of environmental impact, the product challenges the limits of total operational cost efficiency.   This is the 6th generation of products to inherit ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 20 mJ
Average Power: 120 W
Max Repetition Rate: 6000 Hz
GT63A ArF Excimer Laser 90W version
Gigaphoton Inc.
The GT63A, the latest model of the GT series, is a fifth-generation model featuring the same injection-locking platform. The GT63A is mounted with the four “s” series functions designed in response to customers’ needs to create additional value: sMPL (Spectrum Multi-Positioning LNM)*1, the first customer-approved spectrum ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 15 mJ
Average Power: 90 W
Max Repetition Rate: 6000 Hz
GT63A ArF Excimer Laser 60W version
Gigaphoton Inc.
The GT63A, the latest model of the GT series, is a fifth-generation model featuring the same injection-locking platform. The GT63A is mounted with the four “s” series functions designed in response to customers’ needs to create additional value: sMPL (Spectrum Multi-Positioning LNM)*1, the first customer-approved spectrum control ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 60 W
Max Repetition Rate: 6000 Hz
GT62A 6-kHz Excimer Laser 60W version
Gigaphoton Inc.
The GT62A, the latest model of the GT series, is the fourth-generation model featuring the same injection-locking platform; it delivers the world’s highest output, 90 watts, to support double-patterning immersion lithography*. In order to meet a variety of customer needs, a 60-W version of the GT62A also is available to ensure ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 60 W
Max Repetition Rate: 6000 Hz
GT62A 6-kHz Excimer Laser 90W version
Gigaphoton Inc.
The GT62A, the latest model of the GT series, is the fourth-generation model featuring the same injection-locking platform; it delivers the world’s highest output, 90 watts, to support double-patterning immersion lithography*. In order to meet a variety of customer needs, a 60-W version of the GT62A also is available to ensure ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 15 mJ
Average Power: 90 W
Max Repetition Rate: 6000 Hz
GT61A 6 kHz Excimer Laser
Gigaphoton Inc.
Less than a year after we began mass-production and shipment of the GT60A, Gigaphoton has successfully developed the GT61A. Model GT61A offers a 30% improvement of spectral bandwidth (E95%) from that of the GT60A as well as a longer laser chamber life to reduce both downtime and maintenance cost. The GT61A, the third-generation model ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 60 W
Max Repetition Rate: 6000 Hz
GT60A 6 kHz Excimer Laser
Gigaphoton Inc.
Marking less than one year since the company began mass-production and shipment of the GT40A, Gigaphoton has now successfully developed the GT60A, delivering an improved repetition rate 1.5-times that of the GT40A. The GT60A is the latest-generation model, featuring the same injection-locking platform as that used by the GT40A, which ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 60 W
Max Repetition Rate: 6000 Hz
GT40A 4-kHz ArF Excimer Laser
Gigaphoton Inc.
Model GT40A uses an injection-locking resonator (first in the world) as a lithography tool light source to allow simultaneous maintenance of narrower spectral bandwidth and higher output, a combination that is difficult to achieve with conventional technologies. In addition, it provides lower peak-pulse energy that reduces damage to ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 11.25 mJ
Average Power: 45 W
Max Repetition Rate: 4000 Hz
G42A 4-kHz ArF Excimer Laser
Gigaphoton Inc.
4-kHz ArF Excimer Laser for 80-nm Technology Node

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 5 mJ
Average Power: 20 W
Max Repetition Rate: 4000 Hz
G41A 4-kHz ArF Excimer Laser
Gigaphoton Inc.
4-kHz ArF Excimer Laser for Design Rules of up to 0.10 µm

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 5 mJ
Average Power: 20 W
Max Repetition Rate: 4000 Hz
G41K-1H KrF 4 kHz Excimer Laser
Gigaphoton Inc.
As the upgrade version of the second-generation model of 4-kHz excimer laser G41K, G41K-1H is mounted with a magnetic-levitation laser chamber and highly efficient line-narrowing and monitor modules on the G41K platform as standard features to achieve a high output of 40 W, one class higher than any other product. The G41K-1H has ...

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 10 mJ
Average Power: 40 W
Max Repetition Rate: 4000 Hz
G21K 2 kHz KrF Excimer Laser
Gigaphoton Inc.
2 kHz KrF Excimer Laser for 0.13 µm Design Rule

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 10 mJ
Average Power: 20 W
Max Repetition Rate: 2000 Hz
G20K 2 kHz KrF Excimer Laser
Gigaphoton Inc.
The G20K features high energy stability (±0.4%) and a narrow spectral bandwidth (FWHM) of 0.6 pm or less to allow exposure of 0.18-µm geometries at high resolution.

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 10 mJ
Average Power: 20 W
Max Repetition Rate: 2000 Hz
G10K 1-kHz KrF Excimer Laser
Gigaphoton Inc.
Stability and durability are the biggest technological challenges for an excimer laser, because it uses fluorine, high-voltage discharge, and deep UV, all of which are highly reactive. As well as stability and durability, an excimer laser light source for lithography tools requires high monochromaticity for the laser beam and high ...

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 10 mJ
Average Power: 10 W
Max Repetition Rate: 1000 Hz
There are 23 different Excimer from suppliers and manufacturers listed in this category. In just a few clicks you can compare different Excimer with each other and get an accurate quote based on your needs and specifications. Please note that the prices of Excimer vary significantly for different products based on various factors including technical parameters, features, brand name, etc. Please contact suppliers directly to inquire about the details and accurate pricing information for any product model. Simply navigate to the product page of interest and use the orange button to directly reach out to the respective supplier with one click.

Did You know?

The excimer laser was invented in 1970 by Nikolai Basov, V. A. Danilychev and Yu. M. Popov, at the Lebedev Physical Institute in Moscow, using a xenon dimer (Xe2) excited by an electron beam to give stimulated emission at 172 nm wavelength. An excimer laser typically uses a combination of a noble gas and a reactive gas. Under the appropriate conditions of electrical stimulation and high pressure, a pseudo-molecule called an excimer is created, which can only exist in an energized state and can give rise to laser light in the ultraviolet range.