G21K 2 kHz KrF Excimer Laser
Description
2 kHz KrF Excimer Laser for 0.13 µm Design Rule
G21K 2 kHz KrF Excimer Laser
Specifications |
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|---|---|
| Gas Mixture: | KrF |
| Wavelength: | 248 nm |
| Pulse Energy: | 10 mJ |
| Average Power: | 20 W |
| Max Repetition Rate: | 2000 Hz |
| Pulse Duration: | N/A ns |
Features
- Further enhancement of the field-proven energy stability of the G20K
- Ultra-narrow bandwidth of 0.5 pm (FWHM) achieved by improvement of the line-narrowing module to allow exposure of 0.13 µm geometries
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Ships from:
Japan
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Frequently Asked Questions
The G21K 2 kHz KrF Excimer Laser features further enhancement of the field-proven energy stability of the G20K and an ultra-narrow bandwidth of 0.5 pm (FWHM) achieved by improvement of the line-narrowing module to allow exposure of 0.13 µm geometries.
The G21K 2 kHz KrF Excimer Laser is used in the semiconductor industry for microlithography and other precision material processing applications.
The G21K 2 kHz KrF Excimer Laser is a laser instrument designed for 0.13 µm design rule features.
The repetition rate of the G21K 2 kHz KrF Excimer Laser is 2 kHz.
The wavelength of the G21K 2 kHz KrF Excimer Laser is 248 nm.