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Page 2 - Excimer

ATLEX 500 I F2 Excimer Laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, high repetition rate excimer lasers, designed for low- and mid-range duty cycle applications 

Specifications

Gas Mixture: F2*
Wavelength: 157 nm
Pulse Energy: 1 mJ
Average Power: 0.5 W
Max Repetition Rate: 500 Hz
ATLEX 300 I XeF Excimer Laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, high repetition rate excimer lasers, designed for low- and mid-range duty cycle applications 

Specifications

Gas Mixture: XeF
Wavelength: 351 nm
Pulse Energy: 7 mJ
Average Power: 1.7 W
Max Repetition Rate: 300 Hz
ATLEX 300 I XeCl Excimer Laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, high repetition rate excimer lasers, designed for low- and mid-range duty cycle applications 

Specifications

Gas Mixture: XeCl
Wavelength: 308 nm
Pulse Energy: 8 mJ
Average Power: 2.0 W
Max Repetition Rate: 300 Hz
ATLEX 300 I KrF Excimer Laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, high repetition rate excimer lasers, designed for low- and mid-range duty cycle applications 

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 15 mJ
Average Power: 4.0 W
Max Repetition Rate: 300 Hz
ATLEX 300 I ArF Excimer Laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, high repetition rate excimer lasers, designed for low- and mid-range duty cycle applications 

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 2.4 W
Max Repetition Rate: 300 Hz
ATLEX 300 I F2 Excimer Laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, high repetition rate excimer lasers, designed for low- and mid-range duty cycle applications 

Specifications

Gas Mixture: F2*
Wavelength: 157 nm
Pulse Energy: 1 mJ
Average Power: 0.2 W
Max Repetition Rate: 300 Hz
ATLEX 300 FBG KrF Excimer Laser
ATL Lasertechnik GmbH
Ultra-compact, high efficient excimer laser for Fiber Bragg Grating (FBG) writing 

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 15 mJ
Average Power: 4 W
Max Repetition Rate: 300 Hz
ATLEX 300 FBG ArF Excimer Laser
ATL Lasertechnik GmbH
Ultra-compact, high efficient excimer laser for Fiber Bragg Grating (FBG) writing 

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 2.4 W
Max Repetition Rate: 300 Hz
ATLEX S KrF Excimer Laser (500Hz)
ATL Lasertechnik GmbH
ATLEX-S-Series-Laser is a very compact UV-light source designed for low- and mid-range duty cycle S Applications

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 15 mJ
Average Power: 6 W
Max Repetition Rate: 500 Hz
ATLEX S KrF Excimer Laser (300Hz)
ATL Lasertechnik GmbH
ATLEX-S-Series-Laser is a very compact UV-light source designed for low- and mid-range duty cycle S Applications

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 15 mJ
Average Power: 4 W
Max Repetition Rate: 300 Hz
ATLEX S ArF Excimer Laser (500Hz)
ATL Lasertechnik GmbH
ATLEX-S-Series-Laser is a very compact UV-light source designed for low- and mid-range duty cycle S Applications

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 4 W
Max Repetition Rate: 500 Hz
ATLEX S ArF Excimer Laser (300Hz)
ATL Lasertechnik GmbH
ATLEX-S-Series-Laser is a very compact UV-light source designed for low- and mid-range duty cycle S Applications

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: 2.4 W
Max Repetition Rate: 300 Hz
ATLEX LR compact air-cooled, excimer laser
ATL Lasertechnik GmbH
A new generation of compact air-cooled, excimer lasers, designed for low duty cycle applications 

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 10 mJ
Average Power: N/A W
Max Repetition Rate: N/A Hz
193nm High Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 100 mJ
Average Power: 600 W
Max Repetition Rate: 6000 Hz
351nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: XeF
Wavelength: 351 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
308nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: XeCl
Wavelength: 308 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
248nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: KrF
Wavelength: 248 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
193nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Gigaphoton Inc.
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 1000 mJ
Average Power: 600 W
Max Repetition Rate: 600 Hz
GT65A ArF Excimer Laser
Gigaphoton Inc.
GT65A, the seventh generation of platforms using the injection lock method, is installed with leading-edge technology and achieves further improved productivity (wafer output) for the customer through “exposure performance improvements” due to changeable spectral width (E95) and improved stability, “high availability” due to extended ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 20 mJ
Average Power: 60 W
Max Repetition Rate: 6000 Hz
GT64A ArF Immersion Excimer Laser
Gigaphoton Inc.
The GT64A offers the industry\'s highest output power of 120W with  high beam performance and stability.  With design emphasis on performance, efficiency, and reduction of environmental impact, the product challenges the limits of total operational cost efficiency.   This is the 6th generation of products to inherit ...

Specifications

Gas Mixture: ArF
Wavelength: 193 nm
Pulse Energy: 20 mJ
Average Power: 120 W
Max Repetition Rate: 6000 Hz