ETNA HP IR Diode-Pumped Compact Laser
Description
Thanks to its unique specifications, outstanding stability, high flexibility and maintenance free operation, the ETNA HP is perfectly suited for industrial environment. The ETNA HP delivering more than 170W of green power at 10kHz is the best balance choice between high average power, repetition rate and cost requirements. The ETNA HP is based on Thales latest developments in diode pumping heads renowned for their outstanding power stability. As a unique compromise between energy and repetition rate, the ETNA HP is the best laser solution to mass production requirements for high tech and consumer markets.
ETNA HP IR Diode-Pumped Compact Laser
Specifications |
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Avg. Power: | 220 W |
Wavelength: | 1064 nm |
Repetition Rate: | 4-40kHz |
Spatial Mode (M^2): | 20 |
Pulse Duration: | 85 ns |
Pulse-to-Pulse Stability (RMS): | 1.0 % |
Cooling: | N/A |
Features
- 4 to 40 kHz operation
- 1 0 W at 532 nm
- 2 0 W at 1064 nm
- Outstanding stability
- M between 15 and 40 (on request)
- Compact and ruggedized industrial design
- Options: fiber coupling, integrated attenuator
Applications
- Laser OLED Lift-Off
- CFRP Machining
- Silicon Annealing
- Femtosecond amplifier pumping
- Instrumentation
- Scientific pump source for non-linear optics
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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Ships from:
France
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Sold by:
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On FindLight:
External Vendor
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Frequently Asked Questions
The ETNA HP laser can be used for laser OLED lift-off, CFRP machining, and silicon annealing.
The ETNA HP laser can be used for femtosecond amplifier pumping, instrumentation, and scientific pump source for non-linear optics.
The long term stability of the ETNA HP laser is over 30 hours for the high M² version.
The ETNA HP laser can deliver more than 170W of green power at 10kHz.
The typical pulse width of the ETNA HP laser is 85ns.