AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
Description
AIX 2800G4-TM for GaAs/InP based Optoelectronics and p-HEMT/HBT Devices.
AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
Specifications |
|
|---|---|
| Substrate Size: | 203.2-152.4mm |
| Base Vacuum: | -- Torr |
| Max Substrate Temperature: | -- degC |
| Process Type: | Pulsed Laser Deposition (PLD) |
Features
Unique true horizontal flow Planetary Reactor – Built in best uniformity & highest efficiency
All graphite process chamber – lowest particles and highest repeatability performance
Triple process gas injection – maxed out yield optimization
Single wafer rotation – combining batch chamber productivity with single chamber tunability
Automated satellite loading at high temperature– highest throughput, lowest particles
Applications
Best Deposition Uniformity Control – at wafer level
Lowest Particle Count
Highest Product Yield
Lowest Production Cost
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
Contact Supplier
How to order?
-
Ships from:
Germany
-
Sold by:
-
On FindLight:
External Vendor
Claim AIXTRON SE Page to edit and add data
Frequently Asked Questions
The AIX 2800G4-TM IC2 Deposition System is used for GaAs/InP based Optoelectronics and p-HEMT/HBT Devices.
The features of the AIX 2800G4-TM IC2 Deposition System include a unique true horizontal flow Planetary Reactor, an all graphite process chamber, triple process gas injection, and single wafer rotation.
The AIX 2800G4-TM IC2 Deposition System is best suited for deposition uniformity control at the wafer level, lowest particle count, highest product yield, and lowest production cost.
The design highlights of the AIX 2800G4-TM IC2 Deposition System include automated satellite loading, triple gas injector, and the latest reactor design featuring advanced process tuning, increased process robustness, and minimized overall maintenance.
The available susceptor configurations for the AIX 2800G4-TM IC2 Deposition System are 8 x 6 inch, 60 x 2 inch, 15 x 4 inch, and 14 x 3 inch.