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Thin Film Deposition

Innovacera Metallized Ceramic Substrate
Xiamen Innovacera Advanced Materials Co., Ltd (INNOVACERA)
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Innovacera Metallized Ceramic Substrate
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Innovacera manufactures High-performance metalized substrates and photodiode sub-mounts, circuits, and spacers to customer specifications.

Specifications
Substrate Size: 45-45mm
Base Vacuum: 10^-8 Torr
Max Substrate Temperature: 450 degC
Process Type: Other
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Mgf2 D30/26*10mm for LED Coating
Qinhuangdao Intrinsic Crystal Technology Co.Ltd
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Mgf2 D30/26*10mm for LED Coating
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The index of refraction of magnesium fluoride is nearly ideal for the task of providing minimum reflectance with only a single layer film. When applied at high temperatures, MgF2 becomes a hard, durable coating that meets all standard MIL requirements. It exhibits broadband characteristics and can be applied on a variety of ...

Specifications
Substrate Size: 1-10mm
Base Vacuum: 1 Torr
Max Substrate Temperature: 100 degC
Process Type: Not Specified
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EPEE 550 PECVD Plasma Enhanced CVD For LED Technology
Akrion Systems LLC
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EPEE 550 PECVD Plasma Enhanced CVD For LED Technology
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As LEDs get smaller and films get thinner, LED manufacturers need production-worthy process solutions for the high-speed deposition of uniform SiO2 (silicon dioxide), SiNx (silicon nitride) and SiOxNx (silicon oxynitride) films. NAURA Akrion’s EPEE 550 PECVD (plasma enhanced chemical vapor deposition) product offers LED ...

Specifications
Substrate Size: 1-1mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
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AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
AIXTRON SE
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AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
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AIX 2800G4-TM for GaAs/InP based Optoelectronics and p-HEMT/HBT Devices.

Specifications
Substrate Size: 203.2-152.4mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
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OCTOS 6 Automated Thin Film Deposition Cluster Tool
Kurt J Lesker Co
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OCTOS 6 Automated Thin Film Deposition Cluster Tool
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The Kurt J. Lesker Company® OCTOS cluster tools are proven R&D and pilot production systems for in vacuum transfer between multiple process chambers. Typical applications include Magnetic Tunnel Junctions and Spin Logic devices (GMR, TMR, MRAM, STT), Organic Light Emitting Devices (OLED), Solar Cells (PV, OPV). The OCTOS cluster ...

Specifications
Substrate Size: 150-150mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
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ALD-150LX Atomic Layer Deposition System
Kurt J Lesker Co
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ALD-150LX Atomic Layer Deposition System
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The Kurt J. Lesker Company® (KJLC®) ALD150LX™ is an Atomic Layer Deposition (ALD) system designed specifically for advanced research and development (R&D) applications. Innovative ALD150LX™ design features, like our Patented Precursor Focusing Technology™, blended with advanced process capability provide ...

Specifications
Substrate Size: 150-150mm
Base Vacuum: -- Torr
Max Substrate Temperature: 500 degC
Process Type: Chemical Vapor Deposition (CVD)
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PRO Line PVD 75 Thin Film Deposition System
Kurt J Lesker Co
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PRO Line PVD 75 Thin Film Deposition System
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The Kurt J. Lesker Company® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base ...

Specifications
Substrate Size: 150-150mm
Base Vacuum: 1500 Torr
Max Substrate Temperature: 850 degC
Process Type: Chemical Vapor Deposition (CVD)
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HEX Modular Deposition Systems
Korvus Technology Ltd
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HEX Modular Deposition Systems
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The HEX series is a compact and highly flexible range  of deposition systems which allow the user complete freedom to reconfigure the equipment to suit their current experimental needs or for a future change of direction. The system can be purchased at the most basic level and later upgraded to a ...

Specifications
Substrate Size: 0.5-6mm
Base Vacuum: 300 Torr
Max Substrate Temperature: 500 degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
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There are 8 different Thin Film Deposition from suppliers and manufacturers listed in this category. In just a few clicks you can compare different Thin Film Deposition with each other and get an accurate quote based on your needs and specifications. Please note that the prices of Thin Film Deposition vary significantly for different products based on various factors including technical parameters, features, brand name, etc. Please contact suppliers directly to inquire about the details and accurate pricing information for any product model. Simply navigate to the product page of interest and use the orange button to directly reach out to the respective supplier with one click.