PRO Line PVD 75 Thin Film Deposition System
Description
The Kurt J. Lesker Company® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, automatic substrate loading, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.
PRO Line PVD 75 Thin Film Deposition System
Specifications |
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|---|---|
| Substrate Size: | 150-150mm |
| Base Vacuum: | 1500 Torr |
| Max Substrate Temperature: | 850 degC |
| Process Type: | Chemical Vapor Deposition (CVD) |
Features
Enclosed instrument rack and chamber base
Box 304 stainless steel chamber with aluminum door and large viewport
Manual touch-screen or recipe-controlled, PC based process automation
Turbomolecular or optional cryogenic high vacuum pumping
Applications
Designed for university, industrial, and government lab R&D thin film deposition
OLED/PLED and organic electronics applications
Photovoltaics and semiconductor devices
Optics and decorative coatings
Small batch production
For pricing, technical or any other questions please contact the supplier
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United States
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Frequently Asked Questions
The PRO Line PVD 75 is a thin film deposition system used for university, industrial, and government lab R&D in various applications such as OLED/PLED, photovoltaics, optics, and small batch production.
The key advantages of the PRO Line PVD 75 include improved system base pressures and pump down times, a technically superior chamber design, advanced programming capability, automatic substrate loading, and optimized thin film performance.
The features of the PRO Line PVD 75 include an enclosed instrument rack and chamber base, a 304 stainless steel chamber with an aluminum door and large viewport, manual touch-screen or recipe-controlled process automation, and options for high vacuum pumping, substrate heating/cooling/biasing, and film thickness control.
The PRO Line PVD 75 is designed for thin film deposition in university, industrial, and government lab R&D, as well as applications in OLED/PLED, photovoltaics, semiconductor devices, optics, and decorative coatings.
The PRO Line PVD 75 can be equipped with up to (6) 3'' Torus® Magnetron Sputtering Cathodes, (4) 4'' Thermal Evaporation Sources, and up to 2 LTE Organic Material Evaporation Sources. It also supports ion source substrate cleaning or assisted deposition.