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Pulsed Laser Deposition (PLD) Thin Film Deposition

AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
AIXTRON SE
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AIX 2800G4-TM IC2 DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS
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AIX 2800G4-TM for GaAs/InP based Optoelectronics and p-HEMT/HBT Devices.

Specifications
Substrate Size: 203.2-152.4mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Pulsed Laser Deposition (PLD)
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HEX Modular Deposition Systems
Korvus Technology Ltd
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HEX Modular Deposition Systems
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The HEX series is a compact and highly flexible range  of deposition systems which allow the user complete freedom to reconfigure the equipment to suit their current experimental needs or for a future change of direction. The system can be purchased at the most basic level and later upgraded to a ...

Specifications
Substrate Size: 0.5-6mm
Base Vacuum: 300 Torr
Max Substrate Temperature: 500 degC
Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
Inquire Price
On FindLight marketplace you will find 2 different Pulsed Laser Deposition (PLD) Thin Film Deposition from suppliers around the world. With just a few clicks you can compare different Pulsed Laser Deposition (PLD) Thin Film Deposition and get accurate price quotes based on your needs and quantity required. Note that some wholesale suppliers may offer discounts for large quantities. From any product page you can directly contact any vendor within seconds.