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Grayscale Lithography Microfabrication

HERCULES Lithography Track System
EV Group (EVG)
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HERCULES Lithography Track System
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Based on a modular platform, the HERCULES combines EVG’s established optical mask alignment technology with integrated wafer cleaning, resist coating, baking and resist development modules. The HERCULES enables cassette-to-cassette processing of various wafer sizes.     The HERCULES safely handles thick, highly ...

Specifications
Printing Technology: Grayscale Lithography
Min XY Feature Size: 500 nm
Min Vertical Step: 1000 nm
Min Surface Roughness: 2000 nm
Area Printing Speed: -- mm^2/h
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EVG101 Advanced Resist Processing System
EV Group (EVG)
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EVG101 Advanced Resist Processing System
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The EVG101 resist processing system performs R&D-type processes on a single chamber design, which is fully compatible with EVG’s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured ...

Specifications
Printing Technology: Grayscale Lithography
Min XY Feature Size: -- nm
Min Vertical Step: -- nm
Min Surface Roughness: -- nm
Area Printing Speed: -- mm^2/h
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LITHOSCALE Maskless Exposure Lithography System
EV Group (EVG)
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LITHOSCALE Maskless Exposure Lithography System
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The LITHOSCALE system featuring EV Group’s MLE™ maskless exposure technology tackles legacy bottlenecks by combining powerful digital processing that enables realtime data transfer and immediate exposure, high structuring resolution and throughput scalability. Its mask-free approach eliminates mask-related consumables, ...

Specifications
Printing Technology: Grayscale Lithography
Min XY Feature Size: 1000 nm
Min Vertical Step: -- nm
Min Surface Roughness: -- nm
Area Printing Speed: -- mm^2/h
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Quantum X Two-Photon Grayscale Lithography
Nanoscribe GmbH
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Quantum X Two-Photon Grayscale Lithography
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The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements. The world’s first Two-Photon Grayscale ...

Specifications
Printing Technology: Grayscale Lithography, Two-Photon Grayscale Lithography
Min XY Feature Size: 160 nm
Min Vertical Step: 10 nm
Min Surface Roughness: 10 nm
Area Printing Speed: 3 mm^2/h
Data Sheet
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On FindLight marketplace you will find 4 different Grayscale Lithography Microfabrication from suppliers around the world. With just a few clicks you can compare different Grayscale Lithography Microfabrication and get accurate price quotes based on your needs and quantity required. Note that some wholesale suppliers may offer discounts for large quantities. From any product page you can directly contact any vendor within seconds.