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Two-Photon Grayscale Lithography Microfabrication

Quantum X Two-Photon Grayscale Lithography
Nanoscribe GmbH
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Quantum X Two-Photon Grayscale Lithography
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The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements. The world’s first Two-Photon Grayscale ...

Specifications
Printing Technology: Grayscale Lithography, Two-Photon Grayscale Lithography
Min XY Feature Size: 160 nm
Min Vertical Step: 10 nm
Min Surface Roughness: 10 nm
Area Printing Speed: 3 mm^2/h
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On FindLight marketplace you will find 1 different Two-Photon Grayscale Lithography Microfabrication from suppliers around the world. With just a few clicks you can compare different Two-Photon Grayscale Lithography Microfabrication and get accurate price quotes based on your needs and quantity required. Note that some wholesale suppliers may offer discounts for large quantities. From any product page you can directly contact any vendor within seconds.