Tosoh N Fused Silica Glass
Description
Tosoh N and NP materials are manufactured by fusing a high-purity silica powder using Tosoh's proprietary oxy-hydrogen flame fusion process. Thanks to its high purity, low aluminum content, and extremely low level of bubbles and inclusions, N has become the reference material for a broad range of applications:semiconductor manufacturing, metrology, optics, chemical processing, UV and high-temperature windows to name a few. In particular, N is an enabling material for stringent plasma etch processes used in leading-edge semiconductor manufacturing.
Tosoh N Fused Silica Glass
Specifications |
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|---|---|
| Application Spectrum: | Ultraviolet (UV) |
| Wavelength Range: | 250-2700 nm |
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Frequently Asked Questions
Tosoh N Fused Silica Glass is used for a broad range of applications including semiconductor manufacturing, metrology, optics, chemical processing, UV and high-temperature windows.
Tosoh NP is an enhanced version of N material with further reduced alkali content.
Tosoh N and NP materials are available in ingots with diameters ranging from 575mm to 1,200mm.
The impurity level of the Tosoh N and NP materials is Ave +3σ.
Tosoh OP-3 is an enhanced version of OP-1 material with further reduced alkali content for processes that require extreme contamination control.
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