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Frequently Asked Questions

Yes, there are optional features available with the EF-15005 Electron Gun Column such as beam blanking (basic and external), beam pulsing, computer control, magnetic shielding, beam scanning, and microprocessor controlled beam current regulation.

Yes, there is a datasheet available for the EF-15005 Electron Gun Column.

The applications of the EF-15005 Electron Gun Column include AES-depth profiling, absorbent current EM (electron microscope), elastically scattered EM (electron microscope), UHV Scanning Electron Microscopy (SEM), Scanning Auger Microscopy (SAM), Auger Electron Spectroscopy (AES), Electron Energy Loss Spectroscopy (EELS)/Reflection Energy Energy Loss Spectroscopy (REELS), sample imaging, Electron Backscattered Diffraction (EBSD), and X-ray emission analyses.

The optimum working distance of the EF-15005 Electron Gun Column is 12 mm nominal.

The working distance range of the EF-15005 Electron Gun Column is 10 mm – 50 mm.

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