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High Energy Ion Sources

3000 Ion Source
TELEMARK
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3000 Ion Source
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Telemark ion beam sources have been designed to provide superior performance across large -5 and small substrates. Telemark technology offers low pressure operation (10 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources.   The source design is extremely low maintenance ...

Specifications
Beam Diameter: 114 mm
Energy Range: 0.3-0.3keV
Beam Power: 3000 W
Beam Divergence: 80 deg
Weight: 30 kg
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750 Ion Source
TELEMARK
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750 Ion Source
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Telemark ion beam sources have been designed to provide superior performance across large -5 and small substrates. Telemark technology offers low pressure operation (10 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources.   The source design is extremely low maintenance with ...

Specifications
Beam Diameter: 63 mm
Energy Range: 0.3-0.3keV
Beam Power: 750 W
Beam Divergence: 80 deg
Weight: 28 kg
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1250 Ion Source
TELEMARK
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1250 Ion Source
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Telemark ion beam sources have been designed to provide superior performance across large -5 and small substrates. Telemark technology offers low pressure operation (10 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources.   The source design is extremely low maintenance ...

Specifications
Beam Diameter: 74 mm
Energy Range: 0.3-0.3keV
Beam Power: 1250 W
Beam Divergence: 80 deg
Weight: 28 kg
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Ion Gun Systems G-1
Beam Imaging Solutions
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Ion Gun Systems G-1
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Beam Imaging Solutions (BIS) has two Ion Gun systems to offer. Each Gun includes an ion source assembly, heat sink, acceleration and focusing system, vertical deflection plates, a 6″ long velocity filter and a velocity filter guard ring control unit. Components are assembled in a vacuum housing fitted with a flange for mounting ...

Specifications
Beam Diameter: -- mm
Energy Range: 0.5-10keV
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6 cm RF Ion Beam Source
Plasma Process Group
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6 cm RF Ion Beam Source
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Our smallest ion beam source, the 6cm RF can provide all the benefits of radio frequency ion source technology in a smaller, more compact, and less expensive form. With a maximum beam current of 200mA at 1500V, the 6cm source is ideal for research and smaller production systems. This source also finds a home in etch and ion beam ...

Specifications
Beam Diameter: 60 mm
Energy Range: 0.5-1.5keV
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12 cm RF Ion Beam Source
Plasma Process Group
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12 cm RF Ion Beam Source
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Used primarily for ion assist, the 12cm RF ion beam source also finds great value as a deposition source in smaller systems or an ion beam figuring (IBF) source for large substrates. Providing additional service as a pre-clean source for substrates, the 12cm source is one of the most versatile options available. As with all RF ion ...

Specifications
Beam Diameter: 120 mm
Energy Range: 0.5-1.5keV
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16 cm RF Ion Beam Source
Plasma Process Group
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16 cm RF Ion Beam Source
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Our 16cm RF high current (HC) ion beam source is an industry workhorse. When paired with our IBEAM power supply (and its internal generator) it has output capacity 800mA. This dynamic and versatile source can satisfy a huge array of needs in deposition and large-scale Ion assist processes. Available with standard molybdenum, ...

Specifications
Beam Diameter: 160 mm
Energy Range: 1-1keV
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There are 7 different High Energy Ion Sources from suppliers and manufacturers listed in this category. In just a few clicks you can compare different High Energy Ion Sources with each other and get an accurate quote based on your needs and specifications. Please note that the prices of High Energy Ion Sources vary significantly for different products based on various factors including technical parameters, features, brand name, etc. Please contact suppliers directly to inquire about the details and accurate pricing information for any product model. Simply navigate to the product page of interest and use the orange button to directly reach out to the respective supplier with one click.