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EUV

The EQ-10HR is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HR high repetition rate EUV source is uniquely suited for metrology and research applications where simulation of high volume ...

Specifications

Central Wavelength: 13.5 nm
Spectral Bandwidth: 0.27 nm
EUV Output Power (2pi Steradian): 20 W
Pulse Repetition Rate: 1000-10000Hz
The EQ-10HP is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HP EUV source is uniquely suited for metrology and research applications. The EQ-10 series sources have become the workhorse EUV ...

Specifications

Central Wavelength: -- nm
Spectral Bandwidth: -- nm
EUV Output Power (2pi Steradian): 20 W
Pulse Repetition Rate: 1200-2500Hz
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective light source, based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications. The EQ-10 has become the workhorse EUV source for the EUV community, through its proven ...

Specifications

Central Wavelength: 13.5 nm
Spectral Bandwidth: .27 nm
EUV Output Power (2pi Steradian): 10 W
Pulse Repetition Rate: 1200-2000Hz
There are 3 different EUV from suppliers and manufacturers listed in this category. In just a few clicks you can compare different EUV with each other and get an accurate quote based on your needs and specifications. Please note that the prices of EUV vary significantly for different products based on various factors including technical parameters, features, brand name, etc. Please contact suppliers directly to inquire about the details and accurate pricing information for any product model. Simply navigate to the product page of interest and use the orange button to directly reach out to the respective supplier with one click.

Did You know?

Plasma, considered the fourth state of matter, is a hot ionized medium consisting of roughly equal amounts of positively and negatively charged particles. As plasma is highly influenced by magnetic and electric fields, plasma light sources utilize the properties of plasma to produce extremely high-power light. One of the main applications of plasma light sources is for extreme ultraviolet (EUV) photolithography for semiconductor chip manufacturing. Because EUV uses a greatly reduced wavelength, it enables smaller and more precise features on silicon surface wafers than optical lithography.