Photolithography Services With Feature Resolutions To One Micron
Description
Our proprietary photolithography process defines patterns at extremely fine resolutions on substrates that range in size from the very tiny to the very large, using a broad range of liquid and dry photo-resist films. Our additive photolithography process creates circuit lines by sputtering a positively charged metal to a negatively charged base, then, if needed, plating to build up conductive traces of precise height and width. You get more consistent trace definition, thinner and therefore more flexible circuits (where needed) AND more uniform circuit lines (i.e., same width top and bottom).
Photolithography Services With Feature Resolutions To One Micron
Specifications |
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| Type Of Service: | Concept development, Project management, Engineering design |
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United States
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Frequently Asked Questions
The benefits of using photolithography include higher circuit resolution, more consistent circuit electrical and mechanical performance, and the ability to pack more conductive traces into a smaller area.
The photolithography equipment includes multiple Suss Aligners, which can achieve precision images with photolithography resolution down to one to two microns under class 100 cleanroom conditions, and several 12"-diameter UV light sources, capable of handling substrates between 6" and 12", in class 1000 clean rooms.
Photolithography is a process that defines patterns at extremely fine resolutions on substrates using a broad range of liquid and dry photo-resist films.
The additive photolithography process creates circuit lines by sputtering a positively charged metal to a negatively charged base, then, if needed, plating to build up conductive traces of precise height and width.
The photolithography process achieves image resolutions of one to two microns on substrates up to 12" x 12".