EQ-10HP High Power EUV Light Source
Description
The EQ-10HP is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas. The EQ-10HP EUV source is uniquely suited for metrology and research applications. The EQ-10 series sources have become the workhorse EUV sources for the EUV community, through their proven reliability, ease of use, and low operating cost. The EQ-10HP builds on the technology and track record of Energetiq’s EQ-10 products. The EQ-10HP operates at substantially higher input powers than its predecessors and delivers double the output EUV power and significantly higher brightness, making it suitable for imaging applications such as EUV mask inspection.
EQ-10HP High Power EUV Light Source
Specifications |
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|---|---|
| Central Wavelength: | -- nm |
| Spectral Bandwidth: | -- nm |
| EUV Output Power (2pi Steradian): | 20 W |
| Pulse Repetition Rate: | 1200-2500Hz |
Features
Performance
- 20W into 2π using Xenon
- Up to 2.5 kHz pulse rate
- Small plasma size
- Low debris
Low Cost of Ownership
- Low Xenon flow rate
- Minimized consumable cost
- Small footprint
Proven Reliability
- Patented Electrodeless Z-Pinch™ technology
- CE Mark and SEMI S2-0703 compliant
Applications
EUV Mask Inspection
EUV Metrology
EUV Resist Development
EUV Microscopy
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
Contact Supplier
How to order?
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Ships from:
United States
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Sold by:
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On FindLight:
since 2017
Frequently Asked Questions
The EQ-10HP is a compact, easy-to-use, reliable, and cost-effective EUV light source based on Energetiq’s proven Electrodeless Z-Pinch™ technology using Xenon gas.
The EQ-10HP has a performance of 20W into 2π using Xenon, up to 2.5 kHz pulse rate, small plasma size, and low debris. It also has a low cost of ownership with low Xenon flow rate, minimized consumable cost, and small footprint. It has proven reliability with patented Electrodeless Z-Pinch™ technology and is CE Mark and SEMI S2-0703 compliant.
The EQ-10HP is uniquely suited for metrology and research applications, including EUV Mask Inspection, EUV Metrology, EUV Resist Development, and EUV Microscopy.
The EQ-10HP delivers double the output EUV power and significantly higher brightness, making it suitable for imaging applications such as EUV mask inspection. It is capable of delivering up to 20 Watts of in-band EUV into 2π stera- dians and will run continuously at pulse repetition rates of up to 2.5 kHz.
Energetiq’s unique technology is based on a Z-pinch plasma, but it avoids electrodes entirely by using their patented Electrodeless Z-Pinch™ technology. This technology has been shown to be effective at producing EUV and SXR light.