FilmTek 2000 PAR
Description
The FilmTek™ 2000 PAR is a low-cost solution for high-throughput, fully-automated mapping of patterned wafers for development and production environments. This system combines patented DUV-NIR reflectometry with wafer auto-loader and pattern recognition to deliver unmatched metrology performance at this price point. The FilmTek™ 2000 PAR utilizes SCI’s patented parabolic mirror technology to measure wavelengths from the deep ultra-violet to the near infrared with a spot size as small as 13µm. This system comes with advanced material modeling software to make even the most rigorous of measurement tasks reliable and intuitive. FilmTek™ software includes fully user-customizable wafer mapping capabilities to rapidly generate 2D and 3D data maps of any measured parameter. In addition to user-defined patterns, standard map patterns include polar, X-Y, rθ, or linear. FilmTek™ 2000 PAR incorporates SCI’s generalized material model with advanced global optimization algorithms for simultaneous determination of multiple film characteristics within a fraction of 1 second per site.
FilmTek 2000 PAR
Specifications |
|
|---|---|
| Wavelength Range (reflectance): | 190-1700nm |
| Resolution: | 0.3-2 nm |
| Minimum Scan Time: | 0.2 sec |
Features
Automated stage with autofocus
Automated wafer handling
Camera for imaging measurement location
Pattern recognition
50 micron spot size
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
Contact Supplier
How to order?
-
Ships from:
United States
-
Sold by:
-
On FindLight:
External Vendor
Claim Scientific Computing International Page to edit and add data
Frequently Asked Questions
The FilmTek 2000 PAR is used for high-throughput, fully-automated mapping of patterned wafers for development and production environments.
The spot size of the FilmTek 2000 PAR can be as small as 13µm.
The FilmTek 2000 PAR has simultaneous determination of multiple layer thicknesses, indices of refraction, extinction coefficients, energy band gap, composition, surface roughness, constituent void fraction, crystallinity/amorphization, and film gradient.
The FilmTek 2000 PAR comes with advanced material modeling software to make even the most rigorous of measurement tasks reliable and intuitive.
The FilmTek 2000 PAR utilizes patented DUV-NIR reflectometry with wafer auto-loader and pattern recognition.