FilmTek 2000 SE
Description
The FilmTek™ 2000 SE benchtop metrology system provides unmatched measurement performance, versatility, and speed for unpatterned thin to thick film applications. It is ideally suited for academic and R&D settings. The FilmTek™ 2000 SE combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry to simultaneously measure film thickness, refractive index, and extinction coefficient. Our advanced rotating compensator design allows for precision and accuracy throughout the full range of delta (Δ), including near 0° and 180°. This allows for optimal performance when measurements are not possible near the Brewster condition, a feature essential for accurate measurement of very thin films on silicon or glass substrates. Measurement is efficient and easy. Thousands of wavelengths are simultaneously collected in seconds, and the integrated auto-focus feature eliminates the tedious task of manual sample alignment required by comparable ellipsometers. The FilmTek™ 2000 SE is a fully-integrated package, paired with intuitive material modeling software to make even the most demanding of measurement tasks simple and reliable. FilmTek™ software includes fully user-customizable sample mapping capabilities to rapidly generate 2D and 3D data maps of any measured parameter. In addition to user-defined patterns, standard map patterns include polar, X-Y, rθ, or linear.
FilmTek 2000 SE
Specifications |
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|---|---|
| Wavelength Range (reflectance): | 240-1700nm |
| Resolution: | 0.3 nm |
| Minimum Scan Time: | 2 sec |
Features
Spectroscopic ellipsometry with rotating compensator design (300nm-1700nm)
Multi-angle, polarized spectroscopic reflection (240nm-1700nm)
Measures film thickness and index of refraction independently
Automated stage with autofocus
Ideal for measuring ultra-thin films (0.03 Å repeatability on native oxide)
Optional generalized ellipsometry (4×4 matrix generalization method) for anisotropy measurements (nx, ny, nz)
For pricing, technical or any other questions please contact the supplier
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United States
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Frequently Asked Questions
Yes, the FilmTek 2000 SE has an optional generalized ellipsometry (4x4 matrix generalization method) for anisotropy measurements (nx, ny, nz).
Yes, the FilmTek 2000 SE has an automated stage with autofocus and integrated software that makes measurement efficient and easy.
The FilmTek 2000 SE is a benchtop metrology system used for measuring film thickness, refractive index, and extinction coefficient in unpatterned thin to thick film applications.
The FilmTek 2000 SE has a repeatability of 0.03 Å on native oxide, making it ideal for measuring ultra-thin films.
The FilmTek 2000 SE combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry to simultaneously measure film thickness, refractive index, and extinction coefficient.